Introduction
Rotatable Target
Planar Target
Equipment
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Beijing Xingxingyuan Materials Co.,Ltd supplies sputtering targets including rotary NiCr，NiV，Al ，ZnSn，ZnAl，AZO，Si，Sn，Cr and planar NiCr，NiV ，Cr ，TiAl， Al，Si.
Planar NiCr target (Ni:80/Cr:20±0.5wt%)  Purity99.8%-99.95%. Density:8.5g/cm3.  Grain size:≤50μm, and uniformity for whole target. Straightness ≤0.5mm. Length：3010mm，3710mm and splice。

  • planar Cr target
    Purity99.9%. Density:7.2g/cm3.
    Grain size:≤200μm, and uniformity for whole target.
    Straightness ≤0.1mm.

  • Planar NiV target  (Ni:93/V:7±0.5wt%) Purity99.9%-99.95%. Density:8.7g/cm3.
    Grain size:≤50μm, and uniformity for whole target.
    Straightness ≤0.1mm. Max. length 4 meters.

  • Planar TiAl target  (Ti:50/Al:50±0.5at%)
    Purity99.99%. Density:4.0g/cm3.
    Grain size:≤50μm,and uniformity for whole target.
    Straightness ≤0.1mm.
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